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Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting 被引量:1

Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting
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摘要 A novel technology to manufacture holographic ion beam etched diffraction gratings based on surface thermokinematics is presented. The surface roughness of photoresist gratings is solved by this technology. According to this technology,a holographic ion beam etched blazed grating of 1200 l/mm for use in the ultraviolet region is manufactured. The experimental results show that the grating has good surface quality,low stray light and high diffraction efficiency. In addition,the performance of thes gratings satisfies the operating requirements of ultraviolet spectrograph. A novel technology to manufacture holographic ion beam etched diffraction gratings based on surface therrnokinematics is presented. The surface roughness of photoresist gratings is solved by this technology. According to this technology, a holographic ion beam etched blazed grating of 1200 l/mm for use in the ultraviolet region is manufactured. The experimental results show that the grating has good surface quality, low stray light and high diffraction efficiency. In addition, the performance of thes gratings satisfies the operating requirements of ultraviolet spectrograph.
出处 《Optoelectronics Letters》 EI 2008年第3期177-179,共3页 光电子快报(英文版)
关键词 光栅 紫外线 全息图象 光致抗蚀剂 CLC numbers TN253
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参考文献6

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