期刊文献+

Si薄膜介电函数的椭偏光谱分析 被引量:1

Analysis of Dielectric Function of Silicon Films with Spectroscopic Ellipsometry
下载PDF
导出
摘要 椭圆偏振光谱法(简称椭偏法)是一种常见的薄膜光学参数测试方法,具有灵敏度高、测试精度高且对测试样品无损伤等优点。首先系统介绍了有效介质近似(EMA)理论模型的基本原理,在此基础上,采用EMA模型对制备的Si薄膜样品的椭偏光谱测试结果进行了计算机拟合。结果表明,当设定样品结构为多晶、非晶和孔隙的混合物时,计算结果与测试数据完全吻合,由此得到了样品的微观结构信息。 Spectroscopic ellipsometry(SE), a common method for films optic parameter test, owns several advantages, such as good sensitivity, excellent precision and scatheless to the samples. Firstly, the theory model of effective medium approximation(EMA) is introduced, then a computer theory fitting between EMA model and the SE measure results is operated. It indicates that the calculated results are consistent with the SE data perfectly when we assume the silicon film as a mixture of amorphous, polycrystalline and voids, and then the microstructure information of samples is obtained.
出处 《半导体光电》 EI CAS CSCD 北大核心 2008年第2期226-230,共5页 Semiconductor Optoelectronics
基金 四川省应用基础研究基金资助项目(04JY029-104)
关键词 椭偏光谱法 有效介质近似 SI薄膜 拟合 spectroscopic ellipsometry effective medium approximation silicon films fitting
  • 相关文献

参考文献16

  • 1Gruska B.Ellipsometric analysis of polysilicon layers[J].Thin Solid Films,2000,364(1-2):138-143.
  • 2Aspnes D E,Studna A A.High precision ellipometer[J].Appl.Opt.,1975,14:220-228.
  • 3Petrik P,Fried M,Lohner T,et al.Comparative study of polysilicon-on-oxide using spectroscopic ellipsometry,atomic force microscopy,and transmission electron microscopy[J].Thin Solid Films,1998,313-314:259-263.
  • 4Yu G,Soga T,Shao C L,et al.Optical properties of excimer laser annealed polycrystalline Si by spectroscopic ellipsometry[J].Appl.Surf.Sci.,1997,113-114:489-492.
  • 5Petrik P,Lehnert W,Schneider C,et al.In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry[J].Thin Solid Films,2001,383(1-2):235-240.
  • 6Bruggeman D A G.Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen[J].Ann.Phys.(Leipzig),1935,416(7):636-664.
  • 7Jellison G E,Chisholm Jr M E.Optical functions of chemical vapor deposited thin-film silicon determined by spectroscopic ellipsometry[J].Appl.Phys.Lett.,1993,62(25):3348-3350.
  • 8Snyder P G,Xiong Y M,Woollam J A,et al.Characterization of polycrystalline silicon thin-film multilayers by variable angle spectroscopic ellipsometry[J].Surf.Interface Anal.,1992,18(2):113-118.
  • 9Jellison G E.Use of the biased estimator in the interpretation of spectroscopic ellipsometry data[J].Appl.Opt.,1991,30(23):3354-3360.
  • 10Van Kranendonk J,Sipe J E.Foundations of the macroscopic electromagnetic theory of dielectric media[J].Prog.Opt.,1977,15:245-350.

同被引文献9

引证文献1

二级引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部