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光辐照、热处理对Li_2O-Al_2O_3-SiO_2光敏微晶玻璃光化学加工性能的影响 被引量:1

Effects of UV Illumination and Heat Treatment System on the Photochemistry Machining Process of Li_2O-Al_2O_3-SiO_2 Photoactive Ceramic Glass
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摘要 采用溶胶凝胶法结合高温熔制法,研制了适合微流控芯片用的光敏微晶玻璃。利用XRD、DTA和SEM测试技术,研究了热处理、光辐照对Li2O-Al2O3-SiO2系统微晶玻璃光化学加工性能的影响,确定出较为合理的工艺条件:光照时间30 min,热处理时温度升到485℃保温200 min,600℃保温60 min,升温速率约5℃.min-1。在此基础上,制备出微流控芯片分析用的十字沟道和储液池。 In this paper, the photoactive ceramic glass used for the preparation of the microfluidic chip was obtained by sol-gel method followed by high temperature treatment. With the techniques of XRD, DTA and SEM, the effects of illumination and heat treat- ment conditions on the photosensitivity properties of Li2 O-Al2 O3-SiO2 system glass-ceramics were investigated. The optimal processing condition for the glass was 30 rain of illumination followed by heat treatments at 485℃ for 200 min and 600℃ for 60 min.
出处 《青岛科技大学学报(自然科学版)》 CAS 2008年第2期143-146,159,共5页 Journal of Qingdao University of Science and Technology:Natural Science Edition
基金 国家自然科学基金项目(50572075) 教育部科学技术研究重点项目(206098) 武汉市青年科技晨光计划项目(20045006071-39)
关键词 溶胶凝胶法 微流控芯片 光敏微晶玻璃 光敏性能 sol-gel microfluidic chips photoactive glass ceramics photosensitivity properties
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参考文献8

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