650nm反射10.6μm透射的薄膜干涉滤光片

Interference Filter of Reflectance in 650nm and Transmittance in 10.6μm

针对波长为650nm和10.6μm的激光器,选用了ZnS和YbF3作为膜料,采用离子辅助沉积技术,在多光谱ZnS基底上制备了650nm反射10.6μm透射的薄膜干涉滤光片。通过对膜系设计和优化工艺参数的研究,解决了膜层牢固性,改善了薄膜的激光损伤阈值,并给出了综合测试结果和实测光谱曲线。

On the substrates of multi-spectrum zinc sulfide prepared the coatings of reflectance in 650nm and transmittance in 10.6μm.The coatings were designed and optimized to split the laser of the working wavelength at 650nm and 10.6μm.ZnS and YbF3 were used as the materials and produced by means of ion assisted deposition.The methods of improving the adhesion of layers and the laser-induced damage threshold were studied by a series of experiments.Finally we showed the measurement curves and test results.