摘要
为了检测列阵式靶面均匀照明光学系统的聚焦特性,成功地开发了测定微米量级光强度起伏干涉斑纹投影放大的新技术。报道了测定聚焦光斑一维、二维大尺度不均匀性及小尺度干涉斑纹的实验方法、结果及误差分析。
A new projection technique for measuring the intensity undulations by interference speckles caused in the micrometer magnitude has successfully been developed, in order to test the focal property of optical array system for uniform illumination. The experimental method, measurement results and error analysis for testing the large scale non uniformity of 1 D and 2 D focal spot and interference speckles of the small scale have been presented.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1997年第11期1581-1584,共4页
Acta Optica Sinica
基金
国家高技术惯性约束聚变主题项目
关键词
正交光楔列阵
照明光学系统
惯性约束聚变
uniform illumination, two dimensional segmented wedge array, projection technique, CCD camera.