Si｛111｝的吸附表面结构

ADSORPTION SURFACE STRUCTURE OF THE Si{111}

利用低能电子衍射研究了金属和非金属吸附在Ｓｉ｛１１１｝表面的表面结构。结果显示出：对Ａｌ、Ｇａ、Ｂｉ和Ａｕ原子，形成α－Ｓｉ｛１１１｝３×３Ｒ３０°－Ｍ或β－Ｓｉ｛１１１｝３×３Ｒ３０°－Ｍ结构的共价吸附。对Ｌｉ、Ｎａ和Ａｇ原子，形成正离子吸附，全部经高温解吸后，便诱导出Ｓｉ｛１１１｝１×３重构。对Ｔｅ原子，形成负离子吸附，经高温解吸后，便诱导出Ｓｉ｛１１１｝类（１×１）结构。

In this paper, we have studied the surface structure of the metals and non-metals adsorption on the Si{111} surface by low-energy eneectron diffraction. It is shown, that the covalence adsorption of the α -Si{111} 3×3R30°-M or β- Si{111} 3×3R30°-M structure form, for Al, Ga, Bi and Au atoms. And the plus-ion adsorption form, for the Li, Na and Ag atoms which induted the Si{111} 1×3 reconstruction when the dis-adsorption are all at high temperature. And the minus-ion adsorption form, for the Te atoms which induted the Si{111} like (1×1) structure when the dis-adsorption at a high temperature.