富马酸二甲酯的合成研究

Resistance Film of Platinum by D.C.Magnetron Sputtering

简述了富马酸二甲酯的各种合成方法。详细研究了以对甲基苯磺酸和硫脲作为催化剂、以马来酸酐和甲醇作为原料合成富马酸二甲酯的反应条件，探讨了各种因素对合成反应的影响规律，得出了相应的最佳工艺条件，产品得率为９２％。

The main factors effecting on TCR of the platinum resistance film are studied in this paper on the basis of film theory and experiments,the high purity of material Pt,suitable thickness of depositing film,(normally is near 1/μm)and the crystallization degree after high temperature treatment. The TCR of platinum resistance film,whose thickness is 800 nm,sputtered on high alumina ceramic or microcrystal glass substrate,is 3.850×10 -3 /℃ after high tempenature heat treatment for 1 hour.