对薄膜CrAlTi(Y)N硬度的研究

Yttrium Impurity and Hardness of CrAlTi(Y)N Films

本文研究了Al靶中加入不同含量的稀土钇(Y)对CrAlTiN薄膜硬度的影响。并应用原子力显微镜(AFM)、能谱仪(EDS)、纳米压入仪、显微硬度计对薄膜样品进行分析。结果表明,CrAlTiN薄膜中稀土元素Y的加入使得Al元素单位时间内沉积量提高,CrAlTiN薄膜晶粒细化,薄膜的表面相由CrN、Cr2N向Cr逐渐变化。当Y<0.84%时CrAlTiN薄膜的硬度随着稀土Y含量的升高而降低;当Y>0.84%时CrAlTiN薄膜的硬度随着Y含量的升高而升高。

Yttrium-doped, CrAlTiN films were grown by magnetmn sputtering, with the Al target containing different Y contents.The films were characterized with energy dispersive speetroseopy（EDS）, atomic force miemscopy（AFM）, X- ray photoelectron spectroscopy（XPS） and conventional probes. The results show that Y-doping significantly affects the mierostruetures and mechanical properties of the CrAlTiN films. For example, Y-doping results in higher Al deposition rate and finer grains.As the Y content increases,the CrN and Cr2N phases gradually transit to Cr;and its micro-hardness first decreases, then increases with a critical Y-content of 0.84%.