磁控溅射SiC/W纳米多层膜的微结构研究

The Microstructures of the Nano-laminated SiC/W Films Grown by Magnetron Sputtering

用磁控溅射法在Si基底上制备了不同调制波长的SiC／W纳米多层膜。利用小角度X射线衍射技术（LXD），详细研究了其中典型的多层膜的调制周期性，各子层的厚度及界面平整度等界面微观结构。结果表明：磁控溅射法制备的纳米多层膜具有较好的周期结构及陡峭的界面梯度，由衍射峰位置计算出的界面不均匀度与子层厚度之比一般在5％以内。另外，对于小角度X射线衍射谱线中的所谓峰分裂现象进行了分析和计算。

The nano-laminated SiC/W films with different alternative lengths,d, were prepared by magnetron sputtering. The periodicity,thickness of the individual layers,interface roughness and its interfacial microstructures of the typical samples were systematically studied with low-angle X-ray diffraction (LXD) technique. Our results showed that the nano-laminated films have good periodicity with we1l-defined sharp interfaces and the ratio of the single layer thickness and the inter facial roughness is less than 5% based on the peak position calculation. The so-called peak splitting of the LXD spectra was analyzed also.