光阴极RF腔中微波过程研究

Microwave processes in a RF photoinjector

由于光阴极RF腔注入器中电子束的脉冲结构由激光控制的特点,根据其电子束脉冲结构的特点,利用微波腔的等效电路,给出了这种微波腔中微波场变化公式,和关于光阴极RF腔的最佳耦合计算公式,并以CAEP光阴极RF腔注入器为例进行理论分析,给出这些变化对电子束参数(如能散度)的影响.

The equivalent-circuit method is adopted to study microwave processes in an RF photoinjector, and the optimized coupling between the input mcirowave system and the RF cavity is theoretically obtained based on the micro-pulse properties of the RF phtoinjector. A CAEP RF photoinjector is theoretically analyzed, and the electron beam energy spread of micro-pulses induced by beam load is also investigated.