摘要
以二甲基二硫化物(DMDS)和正硅酸乙酯(TEOS)为反应物在25Cr35Ni合金基体上化学气相沉积SiO2/S复合涂层。应用热力学势函数法对SiO2与S的生成反应以及反应产物之间的化学反应进行了热力学计算和分析,并对化学气相沉积源物质的配比选择进行了讨论。结果表明:常压下选取预热温度773 K、沉积温度1023 K以及适当配比的源物质化学气相沉积SiO2/S复合涂层是可行的。
The SiO2/S composite coatings were coated by chemical vapor deposition on substrate using methyl disulfide （DMDS） and orthosilicotetraacetate （TEOS） as reactants. 25Cr35Ni alloy Thermodynamic calculation and analysis of the formation reaction of SiO2 and S and the chemical reactions among the reaction products were done by thermodynamic potential function, and the ratio of CVD source materials chosen was discussed. As shown by the experimental results, chemical vapor deposition of the SiO2/S composite coating with preheating temperature of 773 K and deposition temperature of 1 023 K under normal atmospheric pressure was feasible.
出处
《理化检验（化学分册）》
CAS
CSCD
北大核心
2008年第5期405-408,共4页
Physical Testing and Chemical Analysis(Part B:Chemical Analysis)
