摘要
用溶胶-凝胶技术结合旋涂法在硅基片上制备了V2O5纳米薄膜,对样品在空气中进行不同温度的热处理。用X射线衍射(XRD)、扫描电子显微镜(SEM)和FT-IR对V2O5薄膜进行了表征,研究了V2O5的生长过程和反应过程的机理及其微结构随温度的变化。结果表明,可以通过升高热处理温度来提高薄膜样品的结晶程度、颗粒尺寸及其均匀程度,并增强V2O5(001)晶面的取向性,当热处理温度升高至500℃时,样品由非晶薄膜转变为致密的棒状多晶薄膜。同时随着热处理温度的升高,样品中的V4+被氧化为V5+,使薄膜样品结构发生了重排,V=O振动模式发生蓝移。
The V2O5 thin film were prepared by the sol-gel method with spin-on technology. The heat treatment of samples at different temperature was carried out in air atmosphere. The thin film was investigated by X-ray diffraction, the scan electron microscopy and the FT-IR. The development process, the forming mechanism of V2O5 and its microstructure with temperature varying were analyzed. The results show that better crystalline states and better crystalline orientation of V2O5 （001） can be obtained after heat treatment under properly increasing heat treatment temperature. XRD analysis exhibits that the samples show amorphous state before annealing and crystalline state after annealing when the temperature of heat treatment is up to 500 ℃. The stretching vibration of V=O shifts to higher wavenumbers with the increase of heat treatment temperature, which can be explained by oxidizing V^4＋ into V^5＋.
出处
《热加工工艺》
CSCD
北大核心
2008年第8期54-56,共3页
Hot Working Technology
基金
国家自然科学基金资助项目(50272027)
