摘要
利用强短脉冲供电电源和一种新型的辉光放电灯联用进行阴极表面溅射,发现它与在直流供电下有不同的结果.扫描电镜进行观察,得到样品溅射表面的扫描图。结果表明,该技术为金属或合金样品表面的逐层分析提供了一种新方法.
Sample cathode sputtered under the conditions of high current and microsecond pulsed power supply can reach a finer surface, and the sputtering rate was smaller than that of the direct current mode without decreasing the spectra intensity. This will be helpful to get a higer resolution when using it as a technique to gain a surface layer profile.
出处
《分析科学学报》
CAS
CSCD
1997年第2期89-92,共4页
Journal of Analytical Science
基金
国家自然科学基金
关键词
短脉冲供电
辉光放电
阴极溅射
HCMSP
逐层分析
High current and microsecond pulsed power supply, Glow discharge, Cathode sputtering