1064 nm激光脉冲致光学薄膜分层剥落损伤特性

Delamination of Optical Thin Films Induced by 1064 nm Laser Pulse

研究了1064 nm激光辐照致光学薄膜分层剥落的损伤特性及其抑制手段。从光学薄膜的界面结构出发分析了温升在分层剥落产生过程中的作用,从理论上得出了剥落面积与辐照脉冲能量之间的关系式并通过实验进行验证,间接证明了分层剥落的成因;对分层剥落的抑制、改善方法进行了理论探讨与实验,证明亚阈值能量脉冲预辐照之后剥落面积明显减小,并且在一定范围内预辐照脉冲的能量密度越高相应的效果越明显,对作用机制给出了定性解释。

The delamination characteristic of optical thin films induced by laser pulse at 1064 nm and its restraining method were studied. The process of delamination was analyzed and the relationship between the area of delamination and the energy of irradiating pulse was deduced theoretically and proved experimenlally. Some theories probes to control delamination were done and it was found that irradiation with low energy density pulse could enhance the delaminating threshold and reduce the area of delamination. The effect was found more evident with higher pulse energy density in some range and the mechanism was presented.