摘要
为了解N i-纳米S iC体系的刷镀特性,针对N i刷镀液、纳米S iC和分散剂组成的刷镀液体系的沉降过程进行了研究。试验表明:当分散剂浓度大于2.5%时,可以充分分散纳米S iC颗粒,在沉降过程中,不易形成大的颗粒聚集体,颗粒的最终沉积密度增大,沉降粉体体积减小;在同样条件下,随着环境温度的升高,造成连续相黏度下降及扩散速度加快,使沉降速度升高;镀液中纳米S iC含量≤3g/L时,在分散剂作用下纳米S iC分布均匀稳定,沉积速度减慢。
In order to know the brush-plating characteristic of Ni-(nano) SiC system, the sedimentation process of brush-plating solution system containing : Ni solution, (nano) SiC and dispersant was studied. Test results show that when the concentration of dispersant is above 2.5 %, it can fully disperse the SiC particles, and in the process, it is not likely to form large congregating grains, so the final deposit density is large, at the same time the volume of precipitated dust particles are small; in the same condition, when temperature goes up, it causes the continuous relative viscosity goes down and fasten the pervasion and deposition speed; when the content of (nano)SiC in brush-plating solution is less than 3g/L, the SiC distribution tends to be stable with the effect of dispersant, and the deposit speed slows down.
出处
《表面技术》
EI
CAS
CSCD
2008年第3期44-45,共2页
Surface Technology