用靶添加剂提高负溅射离子源流强的研究

Investigations of target additives for enhancing ion beam intensities from sputter negative ion sources

用Hiconex834溅射负离子源研究了Cs_2CrO_4、CsF和CsI等靶添加剂。-定比例的Cs_2CrO_4既改善靶表面的铯覆盖又达到喷氧的效果,Fe^-、Ag^-和Cu^-的流强分别提高到纯铁、银和铜靶的10、6和3.5倍。此外,渗少量卤化铯到合适的金属靶内,可方便地制备强的相应卤素负离子束,用慕尼黑大学的高强度负溅射源,渗5％Fe_2O_3于铁靶中,使Fe^-流强提高了一倍。

Cs2CrO4, CsI and CsF as target additives in Hiconex 834 source have been inve-stigated. It is shown that adding Cs2CrO4 in suitable ratios can improve Cs coverage and obtain the effect of simultaneous spraying of O2. The intensities of Fe-, Ag- and Cu- ion beams are greater than those obtained with pure Fe, Ag and Cu targets, by 10, 6 and 3.5 times, respectively. Negative beams of halogens can be obtained conveniently by mixing corresponding Cs halides with metal to form sputter targets. In the Munich high current source, a Fe target with an admixture of 5% Fe2O3 produces about twice the Fe- beam current as compared to that from a pure Fe target.