二茂铁系光敏成像体系研制

Preparation of a Photoimaging System Containing Ferrocene Derivatives

研制了一种新型光敏成像体系（ＨＬＨ），其感光主组分为二茂铁衍生物（ＨＣＦ），载体为线性酚醛树脂（ＬＰＲ），并用８羟基喹啉（Ｈｏｘ）作为配体提高曝光灵敏度，确定本体系的最佳工艺条件为：感光组分的比例（质量比）为ＨＣＦ∶ＬＰＲ∶Ｈｏｘ＝２∶８∶１；曝光时间为３０ｍｉｎ；显影液为００５％ＮａＯＨ溶液，显影时间为３ｍｉｎ；最后测定了感光特性曲线。这种体系不仅具有良好的亲油性、成膜性和光固化性，而且曝光灵敏度高，分辨率也较好。

A new photoimaging system composed of ferrocene derivatives,linear phenol resin and 8 hydroxyl quine has been prepared,and its optimum technological conditions and photosensitive characteristic curve have been determined.It was found that this system had not only a fine lipophilicity,membrane and photo solidity,but also a high exposure sensitivity and distinguishability.It is of value in development and application.