原子层沉积二氧化硅法对化学镀镍层耐蚀性的影响

Effect of Atomic-layer Deposition of SiO_2 Process on Resistance Corrosion of Chemical Nickel-plate

在化学镀镍的基础上,采用原子层沉积二氧化硅法对镀镍层进行后处理,从而研究此种工艺方法对消除镀镍后产生的微孔,提高试样耐蚀性的效果。结果表明,在工艺参数选择的合适条件下,此工艺法可有效提高试样耐蚀性能。并利用光学显微观察、XRD分析等方法研究此工艺对镀层组织结构和耐蚀性影响。

Basing on chemical nickel-plate, using Atomic-layer deposition of SiO2 process to deal with nickel-plate film, to study the ef- fect of the process on canceling the tiny holes after chemical nickel-plate, to improve the corrosion resistance of the sample. The results showed that： on the condition of suitable craft parameter, the craft process could improve corrosion resistance of the samples effectively. The effect of the craft process on structure of chemical nickel-plate film and the corrosion resistance was analyzed by using optical microscope and XRD.