钽离子注入对锂硅酸盐电极玻璃电性质的影响

The Effect of Tantalum Ion-Implantation on the Electric Conductivity of Lithia-Silica Electrode Glasses

本文在Ｌｉ２Ｏ－Ｌａ２Ｏ３－Ｔａ２Ｏ５－ＳｉＯ２系统电极玻璃中注入５０ｋｅＶ，剂量分别为５×１０６、１×１０１７、２×１０１７ｉｏｎｓ／ｃｍ２的Ｔａ＋离子，测定了注入前后电导率、Ｔｋ－１００的变化，计算了活化能。结果表明，Ｔａ＋离子注入后，随剂量的增加，电导率和Ｔｋ－１００增加，活化能降低。并探讨了注入后电导率和Ｔｋ－１００变化的机理。

The samples of Li 2O-La 2O 3-Ta 2O 5-SiO 2 glass were implanted with tantalum ions at fluences of 5×10 16 、1×10 17 and 2×10 17 ions/cm 2 by using 50 keV MEVVA Ⅳ implanting machine. The electric conductivity of implanted and unimplanted samples were measured by LCR conduction apparatus. After implantation the activation energy of ionic conduction tended to decrease and the value of activation energy correlated with implanting fluence. The electric conductivity of implanted samples was higher than that of unimplanted samples. It was also showed that the characteristic temperature of conduction T k-100 of implanted samples decreased slightly with increasing fluences. The mechanism of conduction for implanted glass was also discussed.