摘要
采用TMCS对超临界干燥后的纳米多孔SiO2薄膜进行疏水处理,利用FTIR、SEM、椭偏仪和LCR测量仪等对薄膜的性能进行表征。研究表明:TMCS修饰后薄膜呈疏水性;薄膜的厚度有所降低,但孔隙率无明显变化;薄膜的实测介电常数值接近理论计算值,为2.0~2.3,且随时间无显著增大。
Nanoporous silica film was treated by TMCS modification after supercritical drying. The properties were characterized by FTIR, SEM, spectroscopic ellipsometry and LCR. The results revealed that: the film was hydrophobic after TMCS treatment; the thickness of the film was decreased but the porosity was nearly the same as before; the dielectric constant measured was about 2.0-2.3 which was close to the calculated, and didn't increase greatly with the time.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2008年第A02期221-224,共4页
Rare Metal Materials and Engineering
基金
国防预研项目资助(41312040307)
关键词
纳米多孔SiO2薄膜
疏水处理
低介电常数
nanoporous silica film
hydrophobic modification
low dielectric constant