摘要
采用TMCS对超临界干燥后的纳米多孔SiO2薄膜进行疏水处理,利用FTIR、SEM、椭偏仪和LCR测量仪等对薄膜的性能进行表征。研究表明:TMCS修饰后薄膜呈疏水性;薄膜的厚度有所降低,但孔隙率无明显变化;薄膜的实测介电常数值接近理论计算值,为2.0～2.3,且随时间无显著增大。
Nanoporous silica film was treated by TMCS modification after supercritical drying. The properties were characterized by FTIR, SEM, spectroscopic ellipsometry and LCR. The results revealed that： the film was hydrophobic after TMCS treatment; the thickness of the film was decreased but the porosity was nearly the same as before; the dielectric constant measured was about 2.0-2.3 which was close to the calculated, and didn＇t increase greatly with the time.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2008年第A02期221-224,共4页
Rare Metal Materials and Engineering
基金
国防预研项目资助(41312040307)
关键词
纳米多孔SiO2薄膜
疏水处理
低介电常数
nanoporous silica film
hydrophobic modification
low dielectric constant
