光敏性ZrO_2-SiO_2有机-无机杂化光学薄膜

Photosensitive ZrO_2-SiO_2 Organic-Inorganic Hybrid Optical Films

以锆和硅的醇盐为原料,合成了平面波导用紫外光敏性ZrO2-SiO2有机-无机杂化溶胶-凝胶光学材料,用旋涂法在单晶硅片上制备了其光学薄膜。用棱镜耦合仪、FTIR红外光谱仪和原子力显微镜(AFM)等测试了薄膜的厚度和折射率、结构基团和薄膜表面粗糙度,并用棱镜耦合法测试了其平板型光波导的光传输损耗。结果表明:该杂化材料可用于制备厚达约20μm、折射率在1.45～1.50间可调、表面粗糙度小(约0.2nm)的均匀光学薄膜;以这些杂化薄膜为导光层和衬底层的平板型光波导的光传输损耗小于1dB/cm。

UV-photosensitive ZrO2-SiO2 hybrid sol-gel materials were synthesized from the precursors of Zr and Si alkoxides and the hybrid optical films were deposited on single-crystal silicon wafers by sol-gel spin-coating. Film thickness and refractive index were measured with a prism-coupler. FTIR spectroscopy was used to investigate the chemical groups in the hybrid films. The surface roughness of the hybrid films was investigated by AFM. Light propagation loss of the slab waveguides with the hybrid films as the guiding layers and buffer layers were measured by prism-coupling. The results indicated that the hybrid films （thickness up to 20 μm; refractive index -1.45-1.50） with relative smooth surface （mean surface roughness - 0.2 nm） could be used to prepare planar waveguides with low light propagation loss （〈 1dB/cm） at 632.8 nm.