摘要
We report on InP-based metamorphic InGaAs photodiodes grown by gas source molecular beam epitaxy （MBE）, in which a relatively thin compositional graded wide band-gap InxAl1-xAs buffer layer is adopted. In the photodiodes, InAiAs is also taken as cap layers, so this structure is suitable for both front and back illuminations. At room temperature the photodiodes show 50% cut-off wavelength of 2.66μm, with measured peak detectivity of 4.91×10^9 cmHz^1/2/W at 2.57μm, and the typical dark current and RoA are 7.68μA/0.94Ωcm^2 and 291 nA/24.29Ωcm^2 at 290 K and 150 K respectively for the devices in diameter 300 μm. Their performances are compared to the 2.5μm cut-off photodiodes with similar structures.
We report on InP-based metamorphic InGaAs photodiodes grown by gas source molecular beam epitaxy （MBE）, in which a relatively thin compositional graded wide band-gap InxAl1-xAs buffer layer is adopted. In the photodiodes, InAiAs is also taken as cap layers, so this structure is suitable for both front and back illuminations. At room temperature the photodiodes show 50% cut-off wavelength of 2.66μm, with measured peak detectivity of 4.91×10^9 cmHz^1/2/W at 2.57μm, and the typical dark current and RoA are 7.68μA/0.94Ωcm^2 and 291 nA/24.29Ωcm^2 at 290 K and 150 K respectively for the devices in diameter 300 μm. Their performances are compared to the 2.5μm cut-off photodiodes with similar structures.
