用PEM监控制备TiO2薄膜及其光学性能的研究

Optical Properties of TiO_2 Thin Films Deposited by PEM Controlled Reactive Sputtering

使用金属钛作靶材,利用中频反应磁控溅射方法在玻璃基底上制备了TiO2薄膜.为使反应溅射的工作点能够稳定在"过渡区",使薄膜获得理想的化学配比和较高的沉积速率,使用了等离子体发射光谱监控法(PEM)对溅射过程进行控制.利用台阶仪测膜厚,用X射线衍射仪、原子力显微镜、分光光度计以及光学薄膜测试分析仪等手段对TiO2薄膜的结构以及光学性能进行表征,研究了不同工艺条件对薄膜结构和光学性能的影响.结果表明,较高的PEM工作点下制备的TiO2薄膜具有较高的折射率,使用PEM控制的中频反应磁控溅射方法可以制备出性能良好的TiO2光学薄膜.

Titanium dioxide thin films for optical applications were deposited on glass substrates by reactive mid-frequency （MF） magnetron sputtering with two Ti metal targets. To obtain a high deposition rate, the plasma emission monitor （PEM） was used to control the sputtering process. The structure and dynamic deposition rate of the films deposited with various deposition parameters were investigated by surface profiler, XRD and AFM, and the optical properties were measured and calculated by spectrophotometer and thin-film analyzer. The results showed that higher PEM setpoints can enable the films to have higher reflective index. In short, the TiO2 thin films prepared in this way can provide favorable optical properties.