期刊文献+

氮氧混合气体平衡态电弧的微观模型研究 被引量:2

Microscopic Model of Thermal Equilibrium Arc in Nitrogen and Oxygen Mixture
下载PDF
导出
摘要 氮气是开关电器的各类保护性气体中比较常见的一种,以其化学稳定性好、性价比高而得到广泛应用。但即使是高纯氮气也不可避免含有其他杂质气体,其中部分气体会对氮气气氛下的电弧产生较大的影响,从而影响触头灭弧和侵蚀特性。笔者针对高纯氮气中混有部分氧气的情况建立了热平衡态电弧微观模型,对电弧微观参数进行了计算,并改变N和O元素的比例来分析氧气的影响,得到了一些有用的结论。 Nitrogen is one of the popular protective gases in switches with good chemical stability and high performance-cost ratio. Some trace gas impurities in nitrogen have obvious influence on arc, resulting in the changes of arc quenching properties and erosion characteristics of contacts. This paper proposes a microscopic model of thermal equilibrium arc burning in mixture of nitrogen and oxygen, and calculates the microscopic parameters of arc with this model. The influence of oxygen on arc is investigated by changing the ratio of nitrogen to oxygen, and the result is analyzed.
出处 《高压电器》 CAS CSCD 北大核心 2008年第3期197-199,202,共4页 High Voltage Apparatus
关键词 氮气 氧气 杂质 电弧 微观模型 nitrogen oxygen impurity Arc microscopic model
  • 相关文献

参考文献4

  • 1HERMANN P K, WERNER F R. Influence of Physical/ Chemical Characteristics of Organic Vapour and Gas Mixtures on Their Contact Compatibility[J]. IEEE Trans. on Components and Packaging Technology, 1999, 22(3): 439-445.
  • 2BENJAMIN C, HASSAN R, ALAIN G. Calculation of the Interruption Capability of SF6-CF4 and SF6-C2F6 Mixtures-part Ⅰ : Plasma Properties [J]. IEEE Trans. on Plasma Science, 1996: 24(1): 198-209.
  • 3VIAL L, CASANOVAS A M, DIAZ J, et ah Decomposition of High-pressure (400 kPa) SF6 and SF6/N2 (10:90) Mixtures Submitted to Negative or 50 Hz AC Corona Discharges in the Presence of Water Vapour and/or Oxygen[J]. J. Phys. D: Appl. Phys., 2001, 34(7): 2037-2051.
  • 4臧春艳,何俊佳,程礼椿.平衡态和非平衡态等离子体的微观模型研究[J].高压电器,2005,41(6):416-419. 被引量:11

二级参考文献7

  • 1Gleizes A, Chervy B, Gonzalez J J. Calculation of A Two-temperature Plasma Composition: Bases and Application to SF6[J]. J Physics D: Applied Physics, 1999(32): 2060-2067.
  • 2Yasunori Tanaka, Yasunobu Yokomizu, Takuji Matsubara,et al. Particle Component of Two-temperature SF6 Plasma in Pressure Range from 0.1 to 1 Mpa [A]. Proc. of the 12th International Conference on Gas Discharge & Their Applications[C], Greifswald, Volume 2, 1997: 566-569.
  • 3Richley E, Tuma D T. On the Determination of Particle Concentrations in Multitemperature Plasmas [J]. J Applied Physics, 1982, 53(2): 8537-8542.
  • 4Aubreton J, Elchinger M F, Fauchais P. New Method to Calculate Thermodynamic and Transport Properties of A Multitemperature Plasma: Application to N2 Plasma[J]. Plasma Chemical & Plasma Processing, 1998, 18(1): 1-27
  • 5Huber K P, Herzberg G, Molecular Spectra and Molecular Structure Ⅳ [M]. Constant of Diatomic Molecules, Van Nostrand Reinhold, 1979.
  • 6Aubreton J, Fauchais P. Influence of the Potential Interaction on Transport Properties in Thermal Plasmas: Examples of Application are Made for Ar-H Mixture at Atmospheric Pressure[J]. Rev. Phys. Appl. 1983(18): 51-62.
  • 7André P, Abbaoui M, Lefort A, et al. Numerical Method and Composition in Multi-temperature Plasmas: Application to an Ar-H2 Mixture[J]. Plasma Chem. Plasma Process. 1996, 16(3): 379-398.

共引文献10

同被引文献28

  • 1薛海涛,李桓,李俊岳,刘金合.电弧等离子体折射率的理论计算[J].机械工程学报,2004,40(8):49-53. 被引量:5
  • 2李俊岳,刘金合,廉金瑞.电弧等离子体的单波长脉冲激光全息诊断[J].焊接学报,1984,5(3):132-144.
  • 3马乃祥.长间隙放电[M].北京:中国电力出版社,1988:54-84.
  • 4The Renardières Group.Research on long air gap discharges at les renardières[J].Electra,1972(23):53-157.
  • 5The Renardières Group.Research on long air gap discharges at les renardières-1973 results[J].Electra,1974(35):49-156.
  • 6The Renardières Group.Positive discharges in long air gap discharges at les renardières-1975 results and conclusions[J].Electra,1977(53):31-151.
  • 7The Renardières Group.Negative discharges in long air gap discharges at les renardières[J].Electra,1981(74):67-156.
  • 8Popov N A.Formation and development of a leader channel in air[J].Plasma Physics Reports,2003,29(8):695-708.
  • 9Gallimberti I,Bacchiega G,Bondiou-Clergerie A,et al.Fundamental processes in long air gap discharges[J].Comptes Rendus Physique,2002,3(10):1335-1359.
  • 10Fukuchi T,Nemoto K.High-speed shadowgraphy and interferometry using an acousto-optic laser deflector[C]// Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series.California,USA:SPIE,2005:132-141.

引证文献2

二级引证文献19

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部