期刊文献+

阴极悬挂方式对电沉积金刚石-镍复合膜品质的影响 被引量:2

Influence of the hanging orientation of cathode to the electrodepositing of diamond-nickel composite film
下载PDF
导出
摘要 给出了阴极悬挂方式对金刚石-镍复合膜电沉积结果的影响,指出:当阴极完全竖直悬挂时,复合膜中无金刚石颗粒沉积;而将阴极上部远离阳极倾斜悬挂时,则可得到有金刚石颗粒分布的复合膜。阴极倾角越大,复合膜中金刚石颗粒含量越高。倾角为45°时,复合膜中金刚石颗粒含量最高而且分布均匀。阴极悬挂方位对沉积复合膜的厚度均匀性有很大影响,电镀过程中阴极沿其自身平面平均间歇旋转90°后继续电镀,可以得到厚度均匀的复合膜。另外,采用扫描电镜(SEM)检测了复合膜中金刚石颗粒的含量和分布情况,采用数显电子测微仪测量复合膜的厚度,并对检测结果作了简要分析。 The influence of the hanging orientation of cathode to the electrodepositing of diamond-nickel composite film was shown in this paper. It was indicated that there were no any diamond grain in the composite film when the cathode was vertically hung in the electrolytic solution; But composite film which contained diamond grains was deposited when the cathode was hung on the condition of the top of the cathode inclined to the. anode. Further more, it was found that diamond grains content in the film increased with increasing of the obliquity of cathode and reached maximum when the obliquity was kept at 45 degree. The hanging orientation of cathode strongly affected the uniformity of the thickness of the film, and uniform films were deposited when cathode was intermittently circumrotated by 90 degree in the plane itself during deposition. On the other hand, scanning electron microscope (SEM) was used to measure the content and the distribution of diamond grains in the film, digital electronic micrometer was used to measure the thickness of the film, respectively. And the measured results were analyzed in this paper, too.
作者 方莉俐
机构地区 中原工学院
出处 《金刚石与磨料磨具工程》 CAS 北大核心 2008年第3期15-18,共4页 Diamond & Abrasives Engineering
关键词 阴极 悬挂 金刚石 复合膜 电沉积 cathode hanging diamond composite film electrodeposition
  • 相关文献

参考文献6

二级参考文献20

  • 1黄辉,林志成,阳范文.镍-碳化硅复合电镀的研究[J].湖南大学学报(自然科学版),1996,23(4):56-61. 被引量:12
  • 2陈国华.电化学方法应用[M].北京:化学工业出版社,2002.160-165.
  • 3PUSHPAVANAM M, NATARAJAN S R, BALAKRISHNAN K. Properties of Ni-WC electrocoposites [J]. Plating and Surface Finishing, 1997, 6:88 -96.
  • 4YEH S H, WAN C C. A study of SiC/Ni composite plating in the Watts bath [J]. Plating and Surface Finishing, 1997, 4:54-57.
  • 5BENEA L, BONORA P L, BORELLO A. Composite electrodeposition to obtain nanostructured coatings [J]. J Electrochem Soc, 2001, 148(7):461 -466.
  • 6VIDINE A B, PODLAHA E J. Composite electrodeposition of ultrafine γ-alumina particles in nickel matrices part I:citrate and chloride electrolytes [ J ]. J Appl Electrochem, 2001, 31(4):461 -468.
  • 7MASSIANI Y, GARNIER A, EYRAND M, et al. Electrochemical properties of compsites based on nanocrystalline anatase ( TiO2 ) and copper cmpond ( CuBr,CuO) [J]. J Appl Electrochem, 2001, 31(5):495-500.
  • 8GUGLIEMI N. Kinetics of the depositions of inert particles from electrolytic bath [J]. J Electrochem Soc,1972, 119(8):1009 -1015.
  • 9WU Gang, LI Ning, DAI Changsong. Electrochemical preparation and characteristics of Ni-Co-LaNi5 composite coatings as electrode materials for hydrogen evolution [ J ]. Materials Chemistry and Physics, 2004 (2):307 -317.
  • 10黄闻天.装饰性无青仿金液的研究[J].华侨大学学报:自然科学版,1999,(2):171-176.

共引文献23

同被引文献43

引证文献2

二级引证文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部