DC磁控溅射沉积WO_3电致变色薄膜

WO_3 Electrochromic Thin Film Deposited by DC Magnetron Sputtering

采用直流磁控反应溅射工艺制备了WO_3薄膜,在初始状态和注入Li离子后的平均透射率分别为83%和6%,变化接近77%,表明该WO_3薄膜样品具有很好的电致变色性能。根据薄膜的透射率和反射率分别计算了WO_3薄膜的光学带隙:非晶WO_3薄膜的带隙为3.31eV,多晶WO_3薄膜的带隙为3.22eV。

WO3 thin films are prepared by DC magnetron sputtering technique. The transimittances of the thin films under the extraction or injection of Li＋ ions are 83% and 6% respectively. It shows the WO3 thin films have a good characterization of eleetroehromism. The optical band gap is calculated via the refleetivity and transmittance of thin films： the amorphous WO3 thin films band gap is 3.31eV,and the polyerystalline WO3 thin films band gap is 3. 22 eV.