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First Measurement of VUV Spectroscopy Using 1 m Normal Incidence Spectrometer on HL-2A 被引量:2

First Measurement of VUV Spectroscopy Using 1 m Normal Incidence Spectrometer on HL-2A
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摘要 A 1 m vacuum ultraviolet (VUV) spectrometer with temporal and spatial resolution was developed for impurity study of HL-2A tokamak. The instrument is equipped with two concave gratings blazed at 80 nm and 150 nm, respectively, and a windowless back-illuminated charge coupled device (CCD) detector of 256 × 1024 pixels. Tile total wavelength coverage of spectrometer is 30~ 320 nm with a spectral resolution of 0.015 nm at a width of entrance slit of 10 μm. A portion of this range is observed during a plasma discharge with a spectral range of 20 nm. The minimum integration time of the detector system is about 6.7 ms for each frame in a full binning mode. Using a space-resolved slit located between the entrance slit and the grating a radial profile on the vertical direction with a range of 400 mm can be obtained. The primary results were successfully obtained with high signal-to-noise ratio and good spectral resolution, which demonstrated the instrument functions very well. A 1 m vacuum ultraviolet (VUV) spectrometer with temporal and spatial resolution was developed for impurity study of HL-2A tokamak. The instrument is equipped with two concave gratings blazed at 80 nm and 150 nm, respectively, and a windowless back-illuminated charge coupled device (CCD) detector of 256 × 1024 pixels. Tile total wavelength coverage of spectrometer is 30~ 320 nm with a spectral resolution of 0.015 nm at a width of entrance slit of 10 μm. A portion of this range is observed during a plasma discharge with a spectral range of 20 nm. The minimum integration time of the detector system is about 6.7 ms for each frame in a full binning mode. Using a space-resolved slit located between the entrance slit and the grating a radial profile on the vertical direction with a range of 400 mm can be obtained. The primary results were successfully obtained with high signal-to-noise ratio and good spectral resolution, which demonstrated the instrument functions very well.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第3期298-301,共4页 等离子体科学和技术(英文版)
基金 National Natural Science Foundation of China(No.10475022)
关键词 VUV spectroscopy line emission CCD VUV spectroscopy, line emission, CCD
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  • 1Cui Z, Wang Q, Dong J, et al. 2004, Plasma Sci. and Technol., 6:2359
  • 2Morita S and Goto M. 2003, Rev. Sci. Instrum., 74: 2036
  • 3Morita S, Muto S, Sakurai M. 1997, Fusion Eng. Design, 34-35:211
  • 4Kubo H, Sugie T, Sakasai A, et al. 1988, Rev. Sci. Instrum., 59:1515
  • 5Castracane J, Demers Y. 1987, Plasma Phys. Control. Fusion, 29:759
  • 6Matthews G F, Stangeby P C, Elder J D, et al. 1992, J. Nucl. Mater., 196-198:374
  • 7Yang Q, Zhou H, Feng B, et al. 2006, Chin. Phys. Lett., 23:891
  • 8Cui Z, Huang Y, Sun P, Zheng Y, et al. 2006, Chin. Phys. Lett., 23:2143
  • 9Cui Z, Sun P, Pan Y, et al. 2006, Chin. Phys., 15:585

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