电致变色WO_3薄膜的结构与光电性能研究

A STUDY OF THE STRUCTURE AND PHOTOELECTRIC PROPERTIES OF ELECTROCHROMIC WO 3 FILMS

对电致变色ＷＯ３薄膜的结构与光电性能进行了研究．首先从ＷＯ３薄膜的微观结构、电子能态出发，分析了电化学反应导致ＷＯ３薄膜光吸收并着色的机理；其次介绍了ＷＯ３薄膜的制作方法和过程．采用真空电子枪将热压块状ＷＯ３（纯度９９．９％）蒸镀在普通玻璃衬底上，然后用多种物理手段测试了ＷＯ３薄膜的性能与工艺参数的关系，如ＸＲＤ、ＸＰＳ．选择适当的工艺参数可使得膜层的特性达到最佳．

This article studies the structure and photoelectric properties of tungsten trioxide films. It starts chiefly from the microstructure of tungsten trioxides, energy state of electrons, the operation principle caused by optical absorption; then it introduces the deposition method and procedure of the films. Here WO 3 thin films are prepared by e type electron beam evaporation of hot pressed WO 3 (purity 99.9%) onto glass substrates. Series of physics methods, such as XRD、XPS, are used to detect the properties of the films and the relations with the technical parameters, and the optimum quality of tungsten trioxide thin films can be obtained through choosing appropriate parameters. The experimental results show that tungsten trioxide thin films are most likely to be used in optoelectronic devices and efficient utilization of solar energy.