摘要
通过在n型InGaAs光吸收层与金属接触间加入p型InGaAs势垒增强层的方法,来提高势垒高度,使其暗电流大为下降,并对其进行了理论和实验研究.
It is shown in this paper that the dark current of InGaAs MSM photodetectors can be greatly reduced with the structure of p-InGaAs Schottky barrier enhanccmcnt layer. Theoretical explanation is given and the lowest dark currents with the order of 10-11A are obtained in our experiments.
出处
《应用科学学报》
CAS
CSCD
1997年第4期424-428,共5页
Journal of Applied Sciences
基金
国家自然科学基金
中国科学院上海冶金所信息功能材料国家重点实验室部分资助