TiN薄膜的溅射制备工艺及光学性能

Preparation of TiN Films with Sputtering Technology and the Optical Properties

在SPF－430H射频磁控溅射系统上用反应溅射方法制备TiN薄膜．研究了制备工艺，讨论了薄膜的光学性能与溅射工艺参数的关系．实验结果表明，在优化制备工艺基础上能制备出具有优良光学性能（高折射率、高透射率）的TiN薄膜．

To improve the anticorrosive ability, the surfaces of the magneto-optical disks are coatedwith protective films. The sputtering technology of the preparation of TiN films on a type SPF-430Hmagnetic-controlled sputtering system is investigated, and the relationship between the sputteringtechnology and the optical properties of the protective films is discussed. Test results show that withoptimization of the technology, TiN films of good optical properties, i. e., with high refractive indexand high transmissivity, are prepared.