Liq／ITO结构表面与界面的AFM和XPS研究

Surface and Interface Investigation of Liq/ITO by Using AFM and XPS

采用真空蒸发沉积的方法,在覆盖有ITO膜的玻璃基片上沉积一层Liq。利用原子力显微镜(AFM)对制备的Liq/ITO样品表面进行扫描,发现Liq粉末表现为岛状形态,其表面极不平整,存在大量裂缝和空隙,有许多针孔。用X射线光电子能谱(XPS)研究了Liq/ITO紧密接触的表面和界面电子状态。对样品In3d和Sn3d的电子状态分析也证实了ITO表面沉积Liq膜存在裂缝和针孔,这些裂缝和针孔吸附了空气中大量的气体分子;对C1s谱的分析发现,ITO膜表面存在一定的C污染;对N1s谱分析可知,界面处N原子与OI、n和Sn原子有相互作用,这将会影响Liq的发光颜色。

Liq was deposited on ITO coated glass by routine vacuum evaporation. The surface and interface of Liq/ITO were investigated by using atomic force microscopy（AFM） and X-ray photoelectron spectroscopy（XPS）. The surface morphology of Liq was checked by AFM with an area of both in lateral and topographic force contact modes. XPS was introduced to study the interface electronic states of Liq/ITO. AFM results Liq grows as island shape, unwell- distributed and film quality of Liq on ITO was very rough with many cracks and pores. The analysis of surface of In3d and Sn3d spectrum by XPS provides additional evidence that the existence of cracks and pores in Liq, which can lead to heavy absorption of gas molecules. The spectrum of Cls indicates the existence of contaminated C atoms in the surface of ITO. The spectrum of Nls showed the interaction between N atoms and O, In and Sn atoms in the surface of ITO,which may affects the EL spectrum of Liq based OLEDs.