Mg2Ni贮氢薄膜的制备及组织结构研究

Preparation and organization structure of Mg_2Ni thin films

采用磁控溅射法制备了Mg2Ni贮氢薄膜,考察了不同基体及基体温度对薄膜组织结构的影响。实验结果表明,Mg2Ni薄膜的表面形貌与衬底类型及衬底温度有关。玻璃片上溅射沉积的膜的表面形貌表面较为平整,而未抛光的Ni片上沉积的薄膜的生长明显存在着沿划痕方向生长的趋势,存在择优取向。另外,当基体温度升高时,薄膜的晶粒尺寸增大。

The Mg2 Ni thin films were prepared by magnetic sputtering. The effects on different morphology of thin films through different substrates and different substrates temperatures were Investigated. The results showed that growth temperature and type played an important role in morphology of Mg2 Ni thin films, surface topography of films deposited on the glass slice was neater,but the films deposited on the hare Ni slice with a strong orientation in surface scratch were obtained. In addition, the grain size enlarged with increased temperature.