磁控溅射TiN/Si3N4纳米复合膜的制备及其环境摩擦学特性

Preparation and Tribological Performance of the TiN/Si_3N_4 Composite Films Deposited by Magnetron Sputtering at Different Environments

在高速钢基体上直流磁控溅射制备TiN/Si3N4纳米复合薄膜。用EDS、XRD、SEM、TEM、HRTEM等对薄膜的组织结构和形貌进行了表征。采用划痕仪和球-盘式摩擦仪分别测试了薄膜的结合力和在大气及真空中的摩擦学性能。结果表明,TiN/Si3N4复合薄膜由纳米TiN相镶嵌于非晶态Si3N4基体内构成。薄膜中Si含量的增加可抑制纳米TiN相的长大,降低薄膜摩擦系数,薄膜的摩擦学性能得到改善。溅射气压升高导致薄膜呈柱状结构,结合力下降,摩擦系数和磨损率上升。0.2Pa下制备含12.9at.%Si的TiN/Si3N4复合薄膜在潮湿空气和真空中均具有良好的摩擦学性能。

TiN/Si3N4 nano composite films were prepared on high speed steel by DC magnetron sputtering. The composition, microstructure and morphology were characterized by EDS, XRD, SEM and HRTEM. The adhesion to substrate and tribological performance in atmosphere and vacuum were evaluated by scratch test and ball-on-disk tribometer respectively. The results show that the TiN/Si3N4 composite films consisted of nano-size TiN dispersed in amorphous Si3 N4 matrix. An increase of the Si content restrained the growth of TiN particles, decreased the friction coefficient, and enhanced the tribological performance of the composite films. As increasing the working pressure, the films were prone to columnar structure, the adhesion to substrate decreased, and the friction coefficient and wear rate increased. The TiN/Si3 N4 composite film with Si content 12.9at. %, which was deposited at 0. 2Pa, has excellent tribological properties both in atmosphere and vacuum.