埋层裸露ZnO：Al-TiO2复合薄膜的制备及光催化性能研究

Underlayer Exposure Treatment of ZnO：Al-TiO2 Coupled Film and Investigation to its Photocatalysis

采用不同方法制备了埋层裸露的ZnO：Al-TiO2复合薄膜，并对其表面形貌、微结构、薄膜厚度以及光催化能力几个方面进行了研究，发现这种结构的薄膜具有增强的光催化性能，于是利用Ag^＋的还原性设计实验对这种结构的光催化机理进行了进一步研究，结果表明，暴露的ZnO：Al埋层作为复合半导体的N极，可以通过界面向溶液中提供光生电子自由e^-，从而抑制光生电荷的复合，提高光催化性能。

Underlayer exposed ZnO：Al-TiO2 coupled films are prepared by different means.Surface morphology by SEM,microstructure by XRD,film thickness by surface profiler and photoeatalysis are investigated .In order to explain the enhanced photocatalysis reaction Ag^＋＋→Ag↓ is adopted to clarife teh mechanism.It turns out that during the process of photocatalsis the exposed part of the underlayer releasese and this suppresses recombimation of light-induced charges,thus enbanced photocatalysis.