摘要
简要回顾MOS晶体管一些具有代表性的技术进展,分析了其在将来超大规模集成电路(ULSI)应用中的主要限制。从材料以及器件结构两个方向分别阐述了突破现有MOS技术而最有希望被将来ULSI工业所采用的新型晶体管技术。
This paper briefly reviewed some of the MOS transistors representative of the technical progress. The main constraints of its applications in the future ultra-large-scale integrated circuits (ULSI) are analyzed. New transistor technology, separately elaborated the breakthrough in the current MOS technology from the materials and the devices structure, are introduced. Three-dimensional transistor structure may be the most promising technology in the future ultra-large-scale integrated circuits (ULSI).
出处
《国外电子元器件》
2008年第7期20-21,24,共3页
International Electronic Elements
关键词
晶体管
高介电常数材料
器件结构
集成电路
transistor
high dielectric constant materials
device structure
integrated circuit