渐进因子分析法在 Ta_2O_5/Ta 样品俄歇深度剖析研究中的应用

APPLICATION OF EVOLVING FACTOR ANALYSIS IN AES DEPTH PROFILES OF Ta 2O 5/Ta SAMPLE

首次利用渐进因子分析法研究了Ｔａ２Ｏ５／Ｔａ样品的俄歇深度剖析过程，获得了样品中Ｔａ的三种不同化学态Ｔａ、Ｔａ２Ｏ５和ＴａＯｘ，并发现Ｔａ２Ｏ５薄膜中经Ａｒ＋离子束轰击后产生的亚稳态产物ＴａＯｘ的ｘ值为１．６，含量接近４０％。Ｔａ２Ｏ５薄膜在深度剖析中未分解出游离态的Ｔａ成分。

In this paper,It is firstly used of evolving factor analysis(EFA) into analyzing AES depth profiles of Ta 2O 5/Ta sample.It found three different chemical states of tantalum which were Ta,Ta 2O 5and TaO x, and discovered that,the film would decompose and produce unstable TaO x component when Ta 2O 5 film was being sputtered by Ar + ion. x value was 1.6 and atomic concentration was about to 40%,but no tantalum emerged in Ta 2O 5 during profiling.