摘要
金刚石膜的电阻率是衡量金刚石膜性能的一个重要指标。由于各种因素的影响，沉积后的金刚石膜的电阻率比较低，还达不到实用要求，需要通过处理加以提高。介绍了几种后处理方法，并对其优缺点进行了比较。
The resistivity of diamond film is an important index for evaluation of its characteristics.The resistivity of as deposited films is fairly low,it can not meet the demond for application,and must be improved by post treatments.Several treatment methods are introduced here,their advantages and disadvantages are compared.
出处
《真空与低温》
1997年第3期175-177,174,共4页
Vacuum and Cryogenics
关键词
金刚石薄膜
电阻率
后处理
退火
Diamond films,Resistivity,Post treatment,Anneal.
