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绒面结构ZnO薄膜及其表面处理 被引量：2

Textured ZnO Thin Film and Its Surface Treatment
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摘要 本文制备出(110)峰取向的绒面结构MOCVD-ZnO:B薄膜并提出CH3COOH湿法刻蚀的表面处理技术。研究表明,绒面结构ZnO:B薄膜具有"类金字塔"晶粒形状;处理前后ZnO:B薄膜的微观结构,方块电阻和光学性能变化不大。适当的表面处理有助于使薄膜表面趋于柔和,有望改善ZnO/Si界面特性,从而应用于μc-Si薄膜太阳电池。 Textured ZnO：B film with（110）peak was fabricated by MOCVD and CH3COOH wet-etching technique was proposed to treat the film surface.Research results indicated that the textured ZnO：B film has large pyramid-like grains.Microstructure,sheet resistance and optical properties of ZnO：B films before and after surface treatment changed little.Appropriate surface treatment of ZnO：B films contributed to render the surface to be gentle and could ameliorate the interface of ZnO/Si layer,which is expected to be applied in μc-Si thin-film solar cells.
作者 陈新亮 薛俊明 张德坤 蔡宁 张晓丹 赵颖 耿新华
机构地区 南开大学光电子薄膜器件与技术研究所
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2008年第3期631-633,共3页 Journal of Synthetic Crystals
基金 国家“973”重点基础研究项目(No.2006CB202602,2006CB202603) 天津重点科技攻关项目(No.06YFGZGX02100) 天津市自然科学基金项目(No.05YFJMJC01600,06YFJZJC01700) 博士启动基金项目(No.J02048)
关键词 MOCVD 绒面ZnO薄膜 湿法刻蚀 太阳电池 MOCVD textured ZnO film wet-etching solar cells
分类号 O484 [理学—固体物理]
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参考文献5

  • 1Kluth O,Rech B,Houben L, et al. Texture Etched ZnO:Al Coated Glass Substrates for Silicon based Thin Film Solar Cells[J]. Thin Solid Films, 1999, 351 : 247.
  • 2Anna Selvan J A. ZnO for Thin Film Solar Cells[ M]. University of Neuchatel, UFO Atelier fur Gestaltung and Verlag, Germany, 1997.
  • 3Bailat J,Domine D,Schluchter R, et al. High-efficiency P-I-N Microcrystalline and Micromorph Thin Film Silicon Solar Cells Deposited on LPCVD ZnO Coated Glass Substrates[C]. Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference, May ,.2006 :1465 .
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同被引文献22

  • 1朱锋,薛玉明,孙建,赵颖,耿新华.绒面ZnO透明导电薄膜[J].人工晶体学报,2004,33(3):419-421. 被引量：3
  • 2陈新亮,薛俊明,孙建,赵颖,耿新华.绒面ZnO薄膜的生长及其在太阳电池前电极的应用[J].Journal of Semiconductors,2007,28(7):1072-1077. 被引量：11
  • 3K.L. Chopra, S. Major andD. K.Pandya. Transparent Conductors-A Status Review[J] .Thin Solid Films, 1983,102:1 - 46.
  • 4A.V. Singh, R.M. Mehra. Highly conductive and transparent aluminum- doped zinc oxide thin films prepared by pulsed laser deposition in oxygen ambient[ J]. JOURNAL OF APPLIED PHYSICS, 2001, 90( 11 ) :5661 - 5665.
  • 5J. Yoo, J. Lee, S. Kim, et al. The properties of surface textured ZnO: AI films for thin film solar cell[J]. Sphys Stat Sol, 2005, 2(3) : 1228 - 1232.
  • 6Min- Jong Keum, Bum- Jin Cho, Hyung- wook Choi. Preparation of Al doped ZnO thin films as a fanction of substrate temperature bya fucingtarget sputtering system [ J ]. Journal of Ceramic Processing Research,2007, 8(1): 56-58.
  • 7S. Mondal, K. P. Kanta, MitraP. Preparation of Al- doped ZnO (AZO) Thin Film by SILAR[J]. Journal of Physical Sciences,2008, 12:221 - 229.
  • 8M. Sochea, S. Christoulakis, N. Katsarakis, T. kitsopoulos and G. Kiriakidis. Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films by direct current magnetron sputtering[J]. Thin Solid Films, 2007,515 : 6562 - 6566.
  • 9Y.H. Kim, K.S. Lee, T.S. Lee, et al. Electrical, structural and etching characteristics of ZnO: AI films prepared by rf magnetron[ J]. Current Applied Physics, 2010, 10:278- 281.
  • 10M. Berginski, J.Httpkes, M. Schuhe,et al.The effect of front ZnO: Al surface texture and optical transparency on efficient light trapping in silicon thin- film solar calls[ J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (3) : 1 - 4.

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人工晶体学报
2008年 第3期

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