摘要
非平衡磁控溅射技术的关键就是设计非平衡磁控溅射靶的靶面磁场分布。改善靶面横向磁场分布的均匀性是提高靶材利用率的有效途径。通过磁场的有限元分析,得到了圆型平面非平衡磁控溅射靶结构参数对靶面磁场均匀性和强度的影响,给出了非平衡磁控溅射靶的优化设计结构,并与实验结果进行了对比分析,靶面磁场强度和分布均匀性得以明显改善。
The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process.It＇s an efficiency approach that optimization design of the distribution of transverse component on the surface for the circular plane unbalanced magnetron sputtering target.The distribution of the transverse component on the target surface was calculated by means of the finite element method,as well as practical measurement with Gauss gauge.The simulation results are consistent with the experiment results accurately with a good precision.These results will have important practical values in optimizing the design of unbalanced magnetron sputtering target and improving the quality of thin films.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2008年第3期759-762,共4页
Journal of Synthetic Crystals
基金
教育部留学回国人员科研启动基金资助项目
关键词
磁控溅射
有限元
横向分量
magnetron sputtering
finite element
transverse component
