摘要
利用金属有机物化学气相沉积(MOCVD)方法在Al2O3(0001)衬底上生长ZnO薄膜,通过改变衬底温度及生长舱压力,得到了各种不同表面形貌的ZnO薄膜。扫描电镜(SEM)用来对样品的形貌进行观察,当衬底温度及生长舱压力分别为400℃,40Pa和450℃,8Pa时,得到了纳米管及纳米墙结构。利用X射线衍射谱(XRD)、透射光谱及光致发光谱对样品的结构及光学性能进行评价。实验结果证明对于较高的生长温度和较低的生长舱压力所生长的样品具有较好的结晶质量。
The ZnO films were deposited by metalorganic chemical vapor deposition （MOCVD） method on substrate Al2O3 （0 0 0 1）. The different structures of films were obtained by changing the grown temperature and pressure. The morphology was investigated by scanning electron microscopy （SEM）. The nanotube and nanowall structures were obtained when grown temperature and pressure were 400 ℃, 40 Pa and 450 ℃, 8 Pa respectively. X-ray diffraction （XRD） , transmission spectra and photoluminescence （PL） were used to analyze the structure and optical peroperties of the films. The results show that the films deposited at higher temperature and lower pressure have a good crystal quality.
出处
《红外与激光工程》
EI
CSCD
北大核心
2008年第3期513-515,共3页
Infrared and Laser Engineering
基金
吉林省科学技术厅科技发展计划项目(200705C01)
关键词
金属有机物化学气相沉积
ZNO薄膜
生长温度
压力
Metalorganic chemical vapor deposition （MOCVD）
ZnO films
Grown temperature
Pressure
