Al掺杂ZnO薄膜原子力显微图像的多重分形研究

Multifractal study of atomic force microscopic images of Al-doped ZnO thin films

用原子力显微镜观察溶胶-凝胶法制备Al掺杂ZnO薄膜的表面形貌,运用多重分形理论研究Al掺杂ZnO薄膜的原子力显微图像,多重分形谱可以很好地定量表征薄膜的表面形貌。结果显示:Al掺杂量为0.5 at.%的ZnO薄膜经550℃退火处理后,rms粗糙度为1.817,Al掺杂量为1.0 at.%的ZnO薄膜经600℃退火处理后,rms粗糙度增大到4.625,相应的分形谱宽Δα从0.019增大到0.287,分形参数Δf由-0.075变为0.124。

Surface topography of Al-doped ZnO（AZO） thin films prepared by sol-gel process was measured with atomic force microscopic. The atomic force microscopic images of Al-doped ZnO thin films were studied by means of multifractal theory. Multifractal spectra were used to characterize the surface roughness of the thin film quantitatively. The results show that rms roughness of the AZO thin film with the Al doping concentration 0.5 at. % annealed at 550 ℃ was 1.817 but that with the Al doping concentration 1.0 at. % annealed at 600 ℃ was 4.625, the width of muhifractal spectrum Aa increased from 0.019 to 0.287, the Af changed from - 0.075 to 0.124, respectively.