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新型光敏聚合物氯代聚肉桂酰胺酮的合成研究

Synthesis of novel photosensitive polymers,chloro substituted poly (cinnamide ketone)s
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摘要 以肉桂酸为原料合成新型含α,β-不饱和酮结构的光敏单体。然后在无水AlCl3、NMP及DCE的存在条件下,将新合成的单体与2,5-二氯对苯二甲酰氯(DCC)进行低温付-克缩聚反应,合成得到一类新型光敏性聚合物材料——氯取代聚肉桂酰胺酮(C-PAMIK)。对缩聚反应的工艺条件进行了优化,并初步表征了所得聚合物。 New photosensitive monomers contained with α, β- unsaturated ketones are synthesized with einnamie acid, then a series of novel photosensitive polymers, ehlom substituted poly (einnamide ketone)s, are prepared by Friedal-Crafts poly-eondensation of the new monomers and 2,5-diehloro-1,4-benzendiearbonyl ehloride(DDC). The optimal eonditions for the poly- condensation are studied,and the prepared polymers are characterized.
出处 《现代化工》 EI CAS CSCD 北大核心 2008年第7期36-38,40,共4页 Modern Chemical Industry
关键词 光敏性聚合物 付-克缩聚 氯取代 聚肉桂酰胺酮 photosensitive polymers Friedal-Crafts poly-eondensation ehloro substituted poly (einnamide ketone) s
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