用改进的两步模拟退火法进行二元光学元件的设计

Design of Binary Optics Using Improved Two-Step Simulated Annealing Algorithm

为了减少二元光学元件设计的计算量并提高设计精度,在对现有算法机理进行深入分析的基础上,提出了适用于二元光学元件设计的两步模拟退火法.该算法在整个退火过程中采用先量化后优化的策略,并将优化过程分为两个阶段:搜索并锁定最优解区间;快速收敛到最优解.模拟实验显示,与传统设计方法相比,该算法不仅保持了全局寻优的特点,而且提高了稳健性和效率.算法剔除了对设计结果影响较大的量化误差,提高了设计精度.用此法实例设计了单焦面辐射聚焦元件,得到了与目标图像一致的光学实验结果.

In order to reduce the calculation amount and improve the design precision of binary optical elements,a two step simulated annealing algorithm is introduced based on the analysis of the present algorithms. The quantized phase data is used in this algorithm and the whole annealing procedure is divided into two steps. Step 1 search and lock the best solution area. Step 2 approach the desired phase data fleetly. Compared with traditional method, simulated test result demonstrates that the algorithm maintains the strongpoint of global optimization, and has better steadiness and greater efficiency. The algorithm also eliminates quantization error and design result is improved. A single-focal plane focusator is designed by using the algorithm and a preferable experimental result is achieved.