摘要
研究了一种制作缺陷光子晶格的新方法,即交叉相位法。利用此方法,成功地在(2+1)维12μm×12μm的光子晶格中构造了微米量级的线缺陷和点缺陷,验证了此方法在构造缺陷光子品格的可行性和优越性。
A new method, which fabricate photonic lattice with a defect was studied, and name the method of across phase. Utilizing this method fabricate the linear defect and the punctuate defect which is about the level of micron in two-dimensional 12μm×12μm photonic lattice successfully, which testify that this method is feasible and ascendant in fabricating photonic lattice with a defect.
出处
《信息记录材料》
2008年第4期23-25,共3页
Information Recording Materials
基金
内蒙古师范大学研究生科研创新基金(YJS07022)资助项目
