铝衬底微等离子体阵列的制作与光电特性测量

Microplasma Arrays Fabricated in Aluminum Substrate and Its Photoelectric Characteristics

在铝衬底上采用光刻工艺制作了带有氧化铟锡（ITO）透明电极的微等离子体阵列，实验研究了该微等离子体阵列在30～100kPa氖气中的放电特性和发光特性．不同微腔尺寸的微等离子体阵列实验结果表明．对于微腔直径为150μm的器件，击穿电压随着工作气压的升高先下降后上升，并且在53．2kPa时达到最小值212V．通过对微腔直径为50μm和30μm器件的击穿电压比较发现，在气压较低时，微腔尺寸大的器件更容易击穿，当气压较高时，微腔尺寸小的器件更容易击穿，并且微腔尺寸小的器件随着气压的升高击穿电压下降得更快．与目前商业等离子体显示器件（PDP）的击穿电压相比，微腔器件的击穿电压更低，而且在高气压下，采用更小的微腔作为PDP的显示单元，可以提高PDP的分辨率．

Microplasma arrays are fabricated in aluminum substrate with indium tin oxides （ITO） electrode. The discharge characteristics and light emission of the devices at atmospheric pressure in neon are investigated experimentally. The experiment results for microplasma devices with different microcavity diameters show that the breakdown voltage of the microplasma device with 150 μm microcavity diameter reduces firstly and then increases as the operation pressure increases, and reaches the minimum value 212 V at 53.2 kPa. Devices with large microcavity diameters are easy to breakdown at low pressures. The breakdown voltage of the device with small microcavity diameter goes down quickly as the operation pressure increases. The breakdown voltage of microcavity is lower than the breakdown voltage of commercial plasma display panel （PDP）. Using small microeavity as pixel of PDP can improve the resolution of PDP at high atmospheric pressure.