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Quantum compact model for thin-body double-gate Schottky barrier MOSFETs

Quantum compact model for thin-body double-gate Schottky barrier MOSFETs
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摘要 Nanoscale Schottky barrier metal oxide semiconductor field-effect transistors (MOSFETs) are explored by using quantum mechanism effects for thin-body devices. The results suggest that for small nonnegative Schottky barrier heights, even for zero barrier height, the tunnelling current also plays a role in the total on-state current. Owing to the thin body of device, quantum confinement raises the electron energy levels in the silicon, and the tradeoff takes place between the quantum confinement energy and Schottky barrier lowering (SBL). It is concluded that the inclusion of the quantum mechanism effect in this model, which considers an infinite rectangular well with a first-order perturbation in the channel, can lead to the good agreement with numerical result for thin silicon film. The error increases with silicon thickness increasing. Nanoscale Schottky barrier metal oxide semiconductor field-effect transistors (MOSFETs) are explored by using quantum mechanism effects for thin-body devices. The results suggest that for small nonnegative Schottky barrier heights, even for zero barrier height, the tunnelling current also plays a role in the total on-state current. Owing to the thin body of device, quantum confinement raises the electron energy levels in the silicon, and the tradeoff takes place between the quantum confinement energy and Schottky barrier lowering (SBL). It is concluded that the inclusion of the quantum mechanism effect in this model, which considers an infinite rectangular well with a first-order perturbation in the channel, can lead to the good agreement with numerical result for thin silicon film. The error increases with silicon thickness increasing.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第8期3077-3082,共6页 中国物理B(英文版)
基金 Project supported by the National Natural Science Foundation of China (Grant No 60206006) the Program for New Century Excellent Talents of Ministry of Education of China (Grant No NCET-05-085) the Xi'an Applied Materials Innovation Fund (Grant No XA-AM-200701)
关键词 Schottky barrier quantum mechanism effects effective mass electron density Schottky barrier, quantum mechanism effects, effective mass, electron density
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参考文献10

  • 1Taur Y 2000 IEEE Electron Device Lett. 21 245
  • 2Wang C, Snyder J P and Tucker J R 1999 Appl. Phys. Lett. 74 1174
  • 3Rhoderick E H and Williams R H 1988 Metal Semiconductor Contacts (Oxford, UK: Clarendon) p86
  • 4Taur Y and Ning T H 1998 Fundamentals of Modern VLSI Devices (Cambridge: Cambridge University Press) p469
  • 5Pellegrini B 1976 J. Phys. D: Appl. Phys. 9 55
  • 6Xiong S Y, King T J and Bokor J 2005 IEEE Trans. Electron Device 52 185
  • 7Huang C K, Zhang W E and Yang C H 1998 IEEE Trans. Electron Devices 45 842
  • 8Winstead B and Ravaioli U 2000 IEEE Trans. Electron Devices 47 1241
  • 9Bacearani G and Reggiani S 1999 IEEE Trans. Electron Devices 46 1656
  • 10Pierret R F 1996 Semiconductor Device Fundamentals (Reading, MA: Addison-Wesley) p492

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