摘要
本文讨论了利用棉偏光谱法测量很薄固体膜的光性的原理和方法,包括椭偏计算模型的建立、模型的合适性等问题,考察了环境介质-薄膜-衬底三根系统和环境介质-薄膜-界面过渡层-衬底四相系统,并引入了一种简化椭偏计算的方法。此外,本文也给出了两个研究实例,包括Si衬底上的Pt膜和PtSi膜。
In this paper, the method for Spectroscopic ellipsometric determination of very thinsolid films including establishment of model for ellipsometric calculation and its feasibility,were described.And systems of ambientthin film-substrate,and ambient-thin film-interface layer-substrate were investigated.A simplified ellipsometric calculation method for two examplesof Pt film and PtSi film on Si substrates were discussed.
关键词
薄膜
椭偏光谱法
光学性质
Optical properties
spectroscopic ellipsometrs
thin film
interface layer
