磁控溅射法在LiNbO_3衬底上制备ZnO薄膜及性能研究

Growth and Properties of ZnO Thin Films on LiNbO_3 Prepared by Magnetron Sputtering

采用磁控溅射法在(001)LiNbO3衬底上制备了ZnO薄膜,并对其进行了退火处理。利用X射线衍射仪(XRD)、紫外-可见光谱仪和光致发光谱(PL)对ZnO薄膜的结构和光学性能进行了分析。结果表明,ZnO薄膜具有(002)的择优取向,退火后ZnO薄膜的(002)衍射峰的强度增强,半高宽减小,(002)峰向高角度方向移动。退火后样品可见光透过率增加,光学带隙发生红移。退火后的样品,紫外发光峰强度增强,可见光发光峰强度相对减弱。

ZnO films were grown on （001） LiNbO3 substrates by magnetron sputtering. Annealing of ZnO films was performed in air for 1 h at 800℃. The structural and optical properties of ZnO thin films on LiNbO3 substrates were in- vestigated. XRD patterns showed that the as-grown and the annealed ZnO films grown on LiNbO3 substrates had c-axis preferential orientation,and the diffraction peaks shift to the higher angle with the annealing, the crystallinity of the ZnO films grown on LiNbO3 substrates was improved by annealing. The transmittance of the ZnO thin films in the visi- ble range was improved after annealing and optical band gap of the ZnO thin films annealed was red shift. The PL spectra showed that the intensity of the UV near-band-edge peak was increased after annealing, while the intensity of visible peak decreased.