摘要
目前,对双层及多层薄膜的端部应力分析已经有了不少工作。有的是从理论上(三角级数法、应力函数法、积分方程法、渐近分析法等)进行分析,也有的是从数值方法(有限元法、边界元法等)上入手,但是其中大部分工作讨论的都是十分规整的几何构型。本文应用有限元方法分析了一些较为复杂的几何构型。通过比较各种形状的结构中应力沿界面的分布,可以增强我们对一些问题的深入理解。
In recent years, there have been a number of papers concerning edge effect stresses in bimaterial and multilayer thin films. Most authors focus attention on regular geometric configuration, using different analytic methods (e.g. trigonometric series, stress function, integral equation, asymptotic analysis, etc. ), or numerical methods (e.g. FEM, BEM, etc.). In the present paper, thin films with more complex edge geometric configuration are analyzed using finite element method. The comparision of stress distributions at the interface of different geometry provides a deeper understanding on some subjects, such as, how edge geometric configuration or composite configuration affects the stress fields, and how to optimize the structure of bilateral and multilayer thin films.
出处
《工程力学》
EI
CSCD
北大核心
1997年第4期104-111,共8页
Engineering Mechanics
基金
国家自然科学基金
国家教委博士点基金
关键词
薄膜
基底
端部问题
有限元
应力集中
thin film, substrate, edge problem,finite element method,stress concentration, structure optimization