摘要
本文在论述真空溅射镀膜的工艺基本环境——异常辉光放电的基础上，阐述了电源的几点要求；提出当前在技术上解决适应真空溅射镀膜的直流电源的几个方案；本文论述了其中第二代采用晶阐管的解决方案，给出了“特性曲线”，该电源具有“陡降”特性，电流稳定度可达±１％。
In this paper, based on the discussion about fundamental condition of vacuum sputter coating technology abnormal glow discharge, the requirements for supply are expounded; some generations for solving the technology that is suitable into the supply of direct current on sputter coating are illustrated; SCR the second generation scheme is introduced and the 'Characteristic Curve' is given, this kind of supply has a 'fall suddenly' characteristic, and it's current stability comes up to ±1%.
出处
《真空》
CAS
北大核心
1997年第5期32-35,共4页
Vacuum
